Description
The Raith e-LiNE is an electron beam lithography tool with a 100 mm by 100 mm travel range. It uses thermal field emission filament technology and a laser-interferometer controlled stage. The column voltage varies from 100 V to 30 kV and the laser stage moves with a precision of 2 nm.
There are six apertures on the system: 7.5, 10, 20, 30, 60, and 120 um. The electron beam current is controlled by selecting the appropriate aperture. The system is equipped with a load lock, an automatic height laser sensor, an Inlens detector and a SE2 detector, with a unique fixed beam moving stage (FBMS) capability and MBMs
Typically, large design patterns are divided into small writing fields, which are then stitched together to form the final pattern. The standard writing field size is 100 um square, with 2 nm pixel size, but the writing fields size can vary from 500 nm up to 2 mm square. Within one writing field, the ebeam is deflected to expose one pixel after another sequentially. When running in FBMS/MBMs mode, the beam position is fixed and ONLY the stage moves. This allows the writing of long features without much stitching error, a function useful to applications such as waveguides.
Capabilities
Nanoengineering options
Focused electron beam induced processes (FEBIP) such as electron beam induced deposition (EBID) or etching (EBIE) can ideally complement EBL, if an existing nanostructure requires just a small in-situ modification or finetuning. State-of-the-art FEBIP applications involving multiple – if required, even simultaneous – gas processes are available for:
• AFM supertip fabrication
• field emission tip fabrication
• 3D nanosculpting
• nanopore fabrication
• hard mask/etch mask fabrication (surface protection/sealing)
• nano/micro tubes/pipettes
• “glueing" nanostructures to the surface
• R&D type circuit edit and mask repair
• in-situ contacting and wiring nanostructures for transport measurements
In order to advance FEBIP applications, precursor and process development is an important topic in applied research today. eLINE has the following suitable supporting options:
• residual gas analyzer (RGA)
• plasma cleaner (“De-Contaminator")
• EDX
Nanomanipulators – in-situ helping hands
eLiNE is the only professional EBL system designed to include multiapplication techniques. Integrated nanomanipulators are operated and live-monitored by the user under visual SEM control – assisted by smart anticollision software control mechanisms. These helping hands at the nanoscale can be used for:
• electrical nanoprobing
• nanomodification (e.g. cutting, bending, erasing…)
EBL full manual.pdf
EBL short manual.pdf
EBL work protocol.pdf